| 表面微/纳米计量中的光学测量方法综述 |
| Review of optical measurement methods in surface micro/nano metrology |
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| 中文摘要: |
| 微纳检测技术旨在以微/纳米级的精度测量加工表面特征，在加工过程的控制、建立表面特征与功能间的联系等方面具有重要作用。光学测量方法具有高精度、快速和无损的特点，是微纳检测技术研发的重要内容。本文介绍了表面形貌和薄膜的光学测量方法，并对各方法的特点及应用场合进行了对比总结。微纳制造技术加工的表面具有结构日益小型化、特征日益复杂化的特点，因此开发多模式测量系统是微纳检测技术的发展趋势。 |
| 英文摘要: |
| Micro?nano detection technology aims to measure the characteristics of machined surface with micro/nano measurement accuracy, which plays an important role in controlling the machining process and establishing the relationship between surface characteristics and functions. Optical measurement method is an important part of micro?nano detection technology because of its high accuracy, fast speed and non?destructiveness. This paper introduces the common optical measurement methods of surface topography and film parameters, and compares and summarizes the characteristics and application occasions of each method in detail. The surface processed by micro?nano manufacturing technology has the development trend of miniaturization of structure and complexity of characteristics. Therefore, it is of great significance to build the multi-mode measurement system for micro?nano detection technology. |
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| 中文关键词: 光学测量方法 表面形貌 薄膜 多模式测量系统 |
| 英文关键词:optical measurement method surface topography film multi⁃mode measurement system |
| 基金项目: |
| DOI：10.11823/j.issn.1674-5795.2023.01.03 |
| 引用本文：袁琳, 郭彤, 郭心远, 祝敏豪, 万一夫.表面微/纳米计量中的光学测量方法综述[J].计测技术,2023,(1):. |
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